Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor

Sohail SAEED; Naghmana RASHID; Khuram Shahzad AHMAD

Makale detayları

Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor

Yazarlar:

Sohail SAEED | Naghmana RASHID | Khuram Shahzad AHMAD

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Chemistry 2013 Vol.37 Issue 5, pp.796-804

Belge Tipi:

Makale

Yayın Tarihi:

4/2013

Belge Dili:

Türkçe

Document ID (Org No.):

2000727339

Sıklık:

İki Aylık

eISSN:

1303-6130

pISSN:

1300-0527

Özet:

 

The copper(II) complex of N-[ethyl(butyl)carbamothioyl]-  3,5-dinitrobenzamide (1) has been synthesized and characterized  by elemental analysis, IR spectroscopy, and atmospheric pressure chemical   ionization-mass spectrometry. Thermogravimetric analysis shows that   complex 2 decomposes in 2 steps to form copper sulfide. The complex was   used as a single-source precursor for the deposition of copper sulfide   thin film by aerosol-assisted chemical vapor deposition at 350 °C. The   powder X-ray diffraction pattern of thin film of the complex showed the   deposition of monoclinic roxbyite Cu7S4 and orthorhombic anilite Cu7S4   phases at 350 °C with spherical crystallites. The degree of film surface   roughness was determined by atomic force microscopy. The scanning electron   microscopy and energy dispersive X-ray analysis results showed the uniform   distribution of copper sulfide in the film, which makes it a useful   semiconducting material on a structured surface.

 

The copper(II) complex of N-[ethyl(butyl)carbamothioyl]-  3,5-dinitrobenzamide (1) has been synthesized and characterized  by elemental analysis, IR spectroscopy, and atmospheric pressure chemical   ionization-mass spectrometry. Thermogravimetric analysis shows that   complex 2 decomposes in 2 steps to form copper sulfide. The complex was   used as a single-source precursor for the deposition of copper sulfide   thin film by aerosol-assisted chemical vapor deposition at 350 °C. The   powder X-ray diffraction pattern of thin film of the complex showed the   deposition of monoclinic roxbyite Cu7S4 and orthorhombic anilite Cu7S4   phases at 350 °C with spherical crystallites. The degree of film surface   roughness was determined by atomic force microscopy. The scanning electron   microscopy and energy dispersive X-ray analysis results showed the uniform   distribution of copper sulfide in the film, which makes it a useful   semiconducting material on a structured surface.

Makale detayları

Aerosol-assisted chemical vapor deposition of copper sulfide nanostructured thin film from newly synthesized single-source precursor

Yazarlar: Sohail SAEED | Naghmana RASHID | Khuram Shahzad AHMAD

Yayıncı: TUBITAK

Dergi: Turkish Journal of Chemistry 2013 Vol.37 Issue 5, pp.796-804

Belge Tipi: Makale

Yayın Tarihi: 4/2013

Belge Dili: Türkçe

Document ID (Org No.): 2000727339

Sıklık: İki Aylık

eISSN: 1303-6130

pISSN: 1300-0527

Sayı

Yazarlar:

Sohail SAEED | Naghmana RASHID | Khuram Shahzad AHMAD

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Chemistry 2013 Vol.37 Issue 5, pp.796-804

Belge Tipi:

Makale

Yayın Tarihi:

4/2013

Belge Dili:

Türkçe

Document ID (Org No.):

2000727339

Sıklık:

İki Aylık

eISSN:

1303-6130

pISSN:

1300-0527