The effects of dental adhesives total etch; self-etch and selective etch application procedures on microleakage in class II composite restorations

Mustafa Yollar; Serpil Karaoğlanoğlu; Elif Tuğba Altıparmak; Elif Aybala Oktay; Numan Aydın; Bilge Ersöz

Makale detayları

The effects of dental adhesives total etch; self-etch and selective etch application procedures on microleakage in class II composite restorations

Yazarlar:

Mustafa Yollar | Serpil Karaoğlanoğlu | Elif Tuğba Altıparmak | Elif Aybala Oktay | Numan Aydın | Bilge Ersöz

Yayıncı:

Istanbul University

Ana Başlıklar:

Dentistry (Other)

Dergi:

European Oral Research Vol.57 Issue 3, pp.151-158

Belge Tipi:

Makale

Yayın Tarihi:

9/2023

Belge Dili:

İngilizce

Document ID (Org No.):

2001303705

pISSN:

2630-6158

Anahtar kelimeler:

Özet:

 Purpose: The aim of this study is to evaluate the amount of microleakage resulting from the application of self-etch, selective etch, etch-and-rinse of adhesive systems in class II cavities. Material and Methods: Four adhesive systems with etch-and-rinse, selective etch and self etch methods were used on the extracted teeth. All groups were restored with G-aenial ACHORD Nanohybrid GC, Tokyo, Japan A2 composite. After 1000 thermal cycles were applied to the teeth after restoration, the samples were kept in 0.5 basic fuchsin for 24 hours. Microleakage values formed after dye penetration with basic fuchsin were determined quantitatively by scoring method on sections taken from each sample in the mesiodistal direction. One-way Analysis of Variance ANOVA and Tukey test were used for statistical analysis of the data p0.05. Results: While there was no statistically significant difference between the etch-and-rinse and selective etch applications of adhesive systems G2-Bond Universal, Clearfil Tri-S Bond Universal PrimeBond Universal and Tokuyama Bond Force II p0.05, there was a statistically significant difference in self-etch application p0.05. As a result of PrimeBond Universals self-etch application, it showed statistically more microleakage than the other three adhesive systems p0.05. Conclusion: It has been observed that additional etching of enamel andor dentin with phosphoric acid reduces the amount of microleakage.

 Purpose: The aim of this study is to evaluate the amount of microleakage resulting from the application of self-etch, selective etch, etch-and-rinse of adhesive systems in class II cavities. Material and Methods: Four adhesive systems with etch-and-rinse, selective etch and self etch methods were used on the extracted teeth. All groups were restored with G-aenial ACHORD Nanohybrid GC, Tokyo, Japan A2 composite. After 1000 thermal cycles were applied to the teeth after restoration, the samples were kept in 0.5 basic fuchsin for 24 hours. Microleakage values formed after dye penetration with basic fuchsin were determined quantitatively by scoring method on sections taken from each sample in the mesiodistal direction. One-way Analysis of Variance ANOVA and Tukey test were used for statistical analysis of the data p0.05. Results: While there was no statistically significant difference between the etch-and-rinse and selective etch applications of adhesive systems G2-Bond Universal, Clearfil Tri-S Bond Universal PrimeBond Universal and Tokuyama Bond Force II p0.05, there was a statistically significant difference in self-etch application p0.05. As a result of PrimeBond Universals self-etch application, it showed statistically more microleakage than the other three adhesive systems p0.05. Conclusion: It has been observed that additional etching of enamel andor dentin with phosphoric acid reduces the amount of microleakage.

 Purpose: The aim of this study is to evaluate the amount of microleakage resulting from the application of self-etch, selective etch, etch-and-rinse of adhesive systems in class II cavities. Material and Methods: Four adhesive systems with etch-and-rinse, selective etch and self etch methods were used on the extracted teeth. All groups were restored with G-aenial ACHORD Nanohybrid GC, Tokyo, Japan A2 composite. After 1000 thermal cycles were applied to the teeth after restoration, the samples were kept in 0.5 basic fuchsin for 24 hours. Microleakage values formed after dye penetration with basic fuchsin were determined quantitatively by scoring method on sections taken from each sample in the mesiodistal direction. One-way Analysis of Variance ANOVA and Tukey test were used for statistical analysis of the data p0.05. Results: While there was no statistically significant difference between the etch-and-rinse and selective etch applications of adhesive systems G2-Bond Universal, Clearfil Tri-S Bond Universal PrimeBond Universal and Tokuyama Bond Force II p0.05, there was a statistically significant difference in self-etch application p0.05. As a result of PrimeBond Universals self-etch application, it showed statistically more microleakage than the other three adhesive systems p0.05. Conclusion: It has been observed that additional etching of enamel andor dentin with phosphoric acid reduces the amount of microleakage.

 Purpose: The aim of this study is to evaluate the amount of microleakage resulting from the application of self-etch, selective etch, etch-and-rinse of adhesive systems in class II cavities. Material and Methods: Four adhesive systems with etch-and-rinse, selective etch and self etch methods were used on the extracted teeth. All groups were restored with G-aenial ACHORD Nanohybrid GC, Tokyo, Japan A2 composite. After 1000 thermal cycles were applied to the teeth after restoration, the samples were kept in 0.5 basic fuchsin for 24 hours. Microleakage values formed after dye penetration with basic fuchsin were determined quantitatively by scoring method on sections taken from each sample in the mesiodistal direction. One-way Analysis of Variance ANOVA and Tukey test were used for statistical analysis of the data p0.05. Results: While there was no statistically significant difference between the etch-and-rinse and selective etch applications of adhesive systems G2-Bond Universal, Clearfil Tri-S Bond Universal PrimeBond Universal and Tokuyama Bond Force II p0.05, there was a statistically significant difference in self-etch application p0.05. As a result of PrimeBond Universals self-etch application, it showed statistically more microleakage than the other three adhesive systems p0.05. Conclusion: It has been observed that additional etching of enamel andor dentin with phosphoric acid reduces the amount of microleakage.

Makale detayları

The effects of dental adhesives total etch; self-etch and selective etch application procedures on microleakage in class II composite restorations

Yazarlar:

Mustafa Yollar | Serpil Karaoğlanoğlu | Elif Tuğba Altıparmak | Elif Aybala Oktay | Numan Aydın | Bilge Ersöz

Yayıncı:

Istanbul University

Ana Başlıklar:

Dentistry (Other)

Dergi:

European Oral Research Vol.57 Issue 3, pp.151-158

Belge Tipi:

Makale

Yayın Tarihi:

9/2023

Belge Dili:

İngilizce

Document ID (Org No.):

2001303705

pISSN:

2630-6158

Adhesion

multimodal adhesive systems

etch-and-rinse adhesives

self-etch adhesives

selective etch

Sayı

Makale detayları

The effects of dental adhesives total etch; self-etch and selective etch application procedures on microleakage in class II composite restorations

Yazarlar: Mustafa Yollar | Serpil Karaoğlanoğlu | Elif Tuğba Altıparmak | Elif Aybala Oktay | Numan Aydın | Bilge Ersöz

Yayıncı: Istanbul University

Ana Başlıklar: Dentistry (Other)

Dergi: European Oral Research Vol.57 Issue 3, pp.151-158

Belge Tipi: Makale

Yayın Tarihi: 9/2023

Belge Dili: İngilizce

Document ID (Org No.): 2001303705

pISSN: 2630-6158

Adhesion

multimodal adhesive systems

etch-and-rinse adhesives

self-etch adhesives

selective etch

Sayı

Yazarlar:

Mustafa Yollar | Serpil Karaoğlanoğlu | Elif Tuğba Altıparmak | Elif Aybala Oktay | Numan Aydın | Bilge Ersöz

Yayıncı:

Istanbul University

Ana Başlıklar:

Dentistry (Other)

Dergi:

European Oral Research Vol.57 Issue 3, pp.151-158

Belge Tipi:

Makale

Yayın Tarihi:

9/2023

Belge Dili:

İngilizce

Document ID (Org No.):

2001303705

pISSN:

2630-6158