Effects of Annealing Temperature on Optical, Surface and Structural Properties of TiN, TiO, TiOxNy Thin Films

Yeliz Özkök; Mustafa Öztürk; Mehmet Çakmak

Makale detayları

Effects of Annealing Temperature on Optical, Surface and Structural Properties of TiN, TiO, TiOxNy Thin Films

Yazarlar:

Yeliz Özkök | Mustafa Öztürk | Mehmet Çakmak

Yayıncı:

Gazi University

Ana Başlıklar:

Fotonik | Optoelektronik ve Optik İletişim

Dergi:

Politeknik Dergisi Vol.28 Issue 2, pp.595-606

Belge Tipi:

Makale

Yayın Tarihi:

3/2025

Belge Dili:

Türkçe

Document ID (Org No.):

2001344331

pISSN:

2147-9429

Anahtar kelimeler:

Özet:

 Titanium nitride TiN, titanium oxide TiO and titanium oxynitride TiOxNy thin films were grown on soda lime glass SLG, pure silicon i-Si and 316L stainless steel 316LSS substrates using the sputtering technique with confocal geometry. In order to improve the physical properties of the films obtained, they were subjected to heat treatment at different temperatures in a diffusion furnace and the effect of annealing temperature on the optical, surface and structural properties of the films was investigated. Optical properties of TiN, TiO, TiOxNy thin films were determined by Attenuated Total Reflection ATR, Fourier transform infrared spectroscopy FTIR, structural properties were determined by X-ray diffraction diffractometer XRD, and surface properties were determined by atomic force microscopy AFM. According to the results obtained from the analyses, annealing temperature improved the physical properties of TiN, TiO, TiOxNy thin films.

 Titanium nitride TiN, titanium oxide TiO and titanium oxynitride TiOxNy thin films were grown on soda lime glass SLG, pure silicon i-Si and 316L stainless steel 316LSS substrates using the sputtering technique with confocal geometry. In order to improve the physical properties of the films obtained, they were subjected to heat treatment at different temperatures in a diffusion furnace and the effect of annealing temperature on the optical, surface and structural properties of the films was investigated. Optical properties of TiN, TiO, TiOxNy thin films were determined by Attenuated Total Reflection ATR, Fourier transform infrared spectroscopy FTIR, structural properties were determined by X-ray diffraction diffractometer XRD, and surface properties were determined by atomic force microscopy AFM. According to the results obtained from the analyses, annealing temperature improved the physical properties of TiN, TiO, TiOxNy thin films.

 Titanium nitride TiN, titanium oxide TiO and titanium oxynitride TiOxNy thin films were grown on soda lime glass SLG, pure silicon i-Si and 316L stainless steel 316LSS substrates using the sputtering technique with confocal geometry. In order to improve the physical properties of the films obtained, they were subjected to heat treatment at different temperatures in a diffusion furnace and the effect of annealing temperature on the optical, surface and structural properties of the films was investigated. Optical properties of TiN, TiO, TiOxNy thin films were determined by Attenuated Total Reflection ATR, Fourier transform infrared spectroscopy FTIR, structural properties were determined by X-ray diffraction diffractometer XRD, and surface properties were determined by atomic force microscopy AFM. According to the results obtained from the analyses, annealing temperature improved the physical properties of TiN, TiO, TiOxNy thin films.

 Titanyum nitrür TiN, titanyum oksit TiO ve titanyum oksinitrür TiOxNy ince filmleri eş-odaklı geometriye sahip püskürtme tekniği kullanılarak soda lime glass SLG, katkısız silisyum i-Si ve 316L paslanmaz çelik 316LSS alttaşlar üzerine büyütülmüştür. Elde edilen filmlerin fiziksel özelliklerinin iyileştirilmesi amacıyla, difüzyon fırınında farklı sıcaklıklarda ısıl işleme tabi tutulmuş ve filmlerin optik, yüzey ve yapısal özellikleri üzerine tavlama sıcaklığının etkisi araştırılmıştır. TiN, TiO, TiOxNy ince filmlerinin optik özellikleri Zayıflatılmış Toplam Yansıma ATR, Fourier dönüşümü kızılötesi spektroskopisi FTIR ile yapısal özellikleri X-ışını kırınım difraktometresi XRD ile yüzey özellikleri atomik kuvvet mikroskobu AFM ile belirlenmiştir. Analizlerden elde edilen sonuçlara göre, tavlama sıcaklığı TiN, TiO, TiOxNy ince filmlerin fiziksel özelliklerinde iyileşme yaratmıştır.

Makale detayları

Effects of Annealing Temperature on Optical, Surface and Structural Properties of TiN, TiO, TiOxNy Thin Films

Yazarlar:

Yeliz Özkök | Mustafa Öztürk | Mehmet Çakmak

Yayıncı:

Gazi University

Ana Başlıklar:

Fotonik | Optoelektronik ve Optik İletişim

Dergi:

Politeknik Dergisi Vol.28 Issue 2, pp.595-606

Belge Tipi:

Makale

Yayın Tarihi:

3/2025

Belge Dili:

Türkçe

Document ID (Org No.):

2001344331

pISSN:

2147-9429

FTIR

AFM

XRD

Sputtering method with confocal geometry

annealing temperature

titanium oxynitrideFTIR

AFM

XRD

Eş-odaklı geometriye sahip püskürtme yöntemi

tavlama sıcaklığı

titanyum oksinitrür

Sayı

Makale detayları

Yazarlar: Yeliz Özkök | Mustafa Öztürk | Mehmet Çakmak

Yayıncı: Gazi University

Ana Başlıklar: Fotonik | Optoelektronik ve Optik İletişim

Dergi: Politeknik Dergisi Vol.28 Issue 2, pp.595-606

Belge Tipi: Makale

Yayın Tarihi: 3/2025

Belge Dili: Türkçe

Document ID (Org No.): 2001344331

pISSN: 2147-9429

Sayı

Yazarlar:

Yeliz Özkök | Mustafa Öztürk | Mehmet Çakmak

Yayıncı:

Gazi University

Ana Başlıklar:

Fotonik | Optoelektronik ve Optik İletişim

Dergi:

Politeknik Dergisi Vol.28 Issue 2, pp.595-606

Belge Tipi:

Makale

Yayın Tarihi:

3/2025

Belge Dili:

Türkçe

Document ID (Org No.):

2001344331

pISSN:

2147-9429