GaN nanostructuring for the fabrication of thin membranes and emerging applications

Ion TIGINYANU; Veaceslav URSAKI

Makale detayları

GaN nanostructuring for the fabrication of thin membranes and emerging applications

Yazarlar:

Ion TIGINYANU | Veaceslav URSAKI

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2014 Vol.38 Issue 3, pp.328-368

Belge Tipi:

Makale

Yayın Tarihi:

2/2014

Belge Dili:

Türkçe

Document ID (Org No.):

2000759952

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101

Anahtar kelimeler:

Özet:

 

We present a review of technological methods developed in recent years for the purpose of gallium nitride nanostructuring, with the main focus on fabrication of thin GaN membranes. In particular, we report on traditional methods of wet etching undercutting for membrane manufacturing, technologies applied for the fabrication of photonic crystal structures based on GaN nanomembranes, double side processing, and surface charge lithography. Prospects of membrane applications in photonic devices, sensors, and microoptoelectromechanical and nanoelectromechanical systems are discussed, taking into account the advantageous piezoelectric, optical, and mechanical properties of GaN and related III-V nitride materials.

 

We present a review of technological methods developed in recent years for the purpose of gallium nitride nanostructuring, with the main focus on fabrication of thin GaN membranes. In particular, we report on traditional methods of wet etching undercutting for membrane manufacturing, technologies applied for the fabrication of photonic crystal structures based on GaN nanomembranes, double side processing, and surface charge lithography. Prospects of membrane applications in photonic devices, sensors, and microoptoelectromechanical and nanoelectromechanical systems are discussed, taking into account the advantageous piezoelectric, optical, and mechanical properties of GaN and related III-V nitride materials.

Makale detayları

GaN nanostructuring for the fabrication of thin membranes and emerging applications

Yazarlar:

Ion TIGINYANU | Veaceslav URSAKI

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2014 Vol.38 Issue 3, pp.328-368

Belge Tipi:

Makale

Yayın Tarihi:

2/2014

Belge Dili:

Türkçe

Document ID (Org No.):

2000759952

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101

GaN nanomembranes

wet etching

photoelectrochemical etching

dry etching

liftoff techniques

e-beam lithography

surface charge lithography

photonic crystal membrane nanocavities

sensors

Sayı

Makale detayları

Yazarlar: Ion TIGINYANU | Veaceslav URSAKI

Yayıncı: TUBITAK

Dergi: Turkish Journal of Physics 2014 Vol.38 Issue 3, pp.328-368

Belge Tipi: Makale

Yayın Tarihi: 2/2014

Belge Dili: Türkçe

Document ID (Org No.): 2000759952

Sıklık: İki Aylık

eISSN: 1303-6122

pISSN: 1300-0101

Sayı

Yazarlar:

Ion TIGINYANU | Veaceslav URSAKI

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2014 Vol.38 Issue 3, pp.328-368

Belge Tipi:

Makale

Yayın Tarihi:

2/2014

Belge Dili:

Türkçe

Document ID (Org No.):

2000759952

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101