The Determination of Thermal Annealing Effect on a-Si:H Films Coated on Glass and on Single Crystalline of Silicon

Necmi SERİN; Tülay SERİN; Ali Rıza ÖZDEMİR; Bora ALKAN

Makale detayları

The Determination of Thermal Annealing Effect on a-Si:H Films Coated on Glass and on Single Crystalline of Silicon

Yazarlar:

Necmi SERİN | Tülay SERİN | Ali Rıza ÖZDEMİR | Bora ALKAN

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2002 Vol.26 Issue 1, pp.53-60

Belge Tipi:

Makale

Yayın Tarihi:

12/2001

Belge Dili:

Türkçe

Document ID (Org No.):

2000762280

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101

Anahtar kelimeler:

Özet:

 

The aim of this study was to examine the effect of thermal annealing on   hydrogenated intrinsic amorphous silicon a-Si:H films.   Hydrogenated intrinsic amorphous films were seperately coated on   glass and single cyrstalline silicon substrates by means of d.c. magnetron   sputtering technique. a-Si:H/glass and a-Si:H/c-Si samples were annealed in   the temperature range of 23-250oC, 23-200oC and   600-1050oC, respectively. The effect of annealing on the a-Si:H films were   examined by means of Infrared vibrational transmittance spectrum technique   (IR) in the wavenumber range 4000-400 cm-1 and Scanning Electron   Microsope (SEM). The results were interpreted in terms of hydrogen   diffusion.

 

The aim of this study was to examine the effect of thermal annealing on   hydrogenated intrinsic amorphous silicon a-Si:H films.   Hydrogenated intrinsic amorphous films were seperately coated on   glass and single cyrstalline silicon substrates by means of d.c. magnetron   sputtering technique. a-Si:H/glass and a-Si:H/c-Si samples were annealed in   the temperature range of 23-250oC, 23-200oC and   600-1050oC, respectively. The effect of annealing on the a-Si:H films were   examined by means of Infrared vibrational transmittance spectrum technique   (IR) in the wavenumber range 4000-400 cm-1 and Scanning Electron   Microsope (SEM). The results were interpreted in terms of hydrogen   diffusion.

Makale detayları

The Determination of Thermal Annealing Effect on a-Si:H Films Coated on Glass and on Single Crystalline of Silicon

Yazarlar:

Necmi SERİN | Tülay SERİN | Ali Rıza ÖZDEMİR | Bora ALKAN

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2002 Vol.26 Issue 1, pp.53-60

Belge Tipi:

Makale

Yayın Tarihi:

12/2001

Belge Dili:

Türkçe

Document ID (Org No.):

2000762280

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101

Turk. J. Phys.

26

(2002)

53-60. Full text: pdf Other articles published in the same issue: Turk. J. Phys.

vol.26

iss.1.

Sayı

Makale detayları

The Determination of Thermal Annealing Effect on a-Si:H Films Coated on Glass and on Single Crystalline of Silicon

Yazarlar: Necmi SERİN | Tülay SERİN | Ali Rıza ÖZDEMİR | Bora ALKAN

Yayıncı: TUBITAK

Dergi: Turkish Journal of Physics 2002 Vol.26 Issue 1, pp.53-60

Belge Tipi: Makale

Yayın Tarihi: 12/2001

Belge Dili: Türkçe

Document ID (Org No.): 2000762280

Sıklık: İki Aylık

eISSN: 1303-6122

pISSN: 1300-0101

Turk. J. Phys.

26

(2002)

53-60. Full text: pdf Other articles published in the same issue: Turk. J. Phys.

vol.26

iss.1.

Sayı

Yazarlar:

Necmi SERİN | Tülay SERİN | Ali Rıza ÖZDEMİR | Bora ALKAN

Yayıncı:

TUBITAK

Dergi:

Turkish Journal of Physics 2002 Vol.26 Issue 1, pp.53-60

Belge Tipi:

Makale

Yayın Tarihi:

12/2001

Belge Dili:

Türkçe

Document ID (Org No.):

2000762280

Sıklık:

İki Aylık

eISSN:

1303-6122

pISSN:

1300-0101